| SOI structure with |
| ultrathin Si oxide |
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| Atomic images of Si(110) surface |
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For the development of supercomputers and multimedia
technologies in the next generation, the newly functional device that can
precisely control even one electron is required. To realize these future
technologies, the ultra-fine structure, in which atomic arrangements are
precisely controlled, is formed with ultimate advanced hardware systems in our
laboratory. With these ultra-fine structures, the ultra-small device can be
fabricated, in which electrons are perfectly controlled to exhibit new
functions. A newly functional integrated device can realize information
processing for large amounts of data and global ultra-fast communications, which
contributes to activate the modern culture and to create new industries. Namely,
the ultimate advanced hardware systems, that create ultra-fine structures, and
newly functional devices consisted of those ultra-fine structures unite us with
the microscopic world with "atoms" and "electrons", which promises our
comfortable future. |
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In our laboratory, the following topics are currently being studied.
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(1) |
Novel bio-sensing device with ultrafine structures |
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Novel light-emitting device with ultrathin Si layers |
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Functionalization of semiconductor surfaces at the atomic and molecular
level by novel liquid/solid reactions |
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(4) |
Fabrication of three-dimensional structures by novel photo-etching |
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Come and join us together ! |
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.gif) |
| Selective adsorption of functional organosilane molecules along step edges
of Si(111) surface |
Step/terrace structures of Cl-terminated Ge(111) surface |
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